Horizontal PECVD Equipment (Poly-Si)

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    Horizontal PECVD Equipment (Poly-Si)

      Features  

    ·The tunnel oxide layer, i-poly, and D-poly layers can be coated in the same furnace tube which helps in reducing the process steps, improving the yield and lowering the breakage rate effectively;

    ·Without hot wall effects, so quartz tube has a long service life;

    ·Slight wrap-around deposition which is easy to be removed;

    ·Precise doping; available to introduce other efficiency-enhancing doping elements, suitable for process expansion and large space for efficiency improvement;

    ·Patented anti-conduction technology.


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